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Comparing positive and negative tone development process for printing the metal and contact layers of the 32- and 22-nm node

dc.contributor.authorBekaert, Joost
dc.contributor.authorVan Look, Lieve
dc.contributor.authorTruffert, Vincent
dc.contributor.authorLazzarino, Frederic
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorReybrouck, Mario
dc.contributor.authorTarutani, Shinji
dc.date.accessioned2021-10-18T15:19:27Z
dc.date.available2021-10-18T15:19:27Z
dc.date.issued2010-12
dc.identifier.issn1537-1646
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16725
dc.sourceIIOimport
dc.titleComparing positive and negative tone development process for printing the metal and contact layers of the 32- and 22-nm node
dc.typeJournal article
dc.contributor.imecauthorBekaert, Joost
dc.contributor.imecauthorVan Look, Lieve
dc.contributor.imecauthorTruffert, Vincent
dc.contributor.imecauthorLazzarino, Frederic
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorReybrouck, Mario
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.contributor.orcidimecTruffert, Vincent::0000-0001-7851-830X
dc.contributor.orcidimecLazzarino, Frederic::0000-0001-7961-9727
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage43007
dc.source.journalJournal of Micro/Nanolithography MEMS and MOEMS
dc.source.issue4
dc.source.volume9
imec.availabilityPublished - open access


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