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Optically enhanced i-line lithography for 0.3-μm random logic applications

dc.contributor.authorYen, Anthony
dc.contributor.authorTzviatkov, Plamen
dc.contributor.authorGrozev, Grozdan
dc.date.accessioned2021-09-29T15:57:16Z
dc.date.available2021-09-29T15:57:16Z
dc.date.issued1996
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/1679
dc.sourceIIOimport
dc.titleOptically enhanced i-line lithography for 0.3-μm random logic applications
dc.typeJournal article
dc.contributor.imecauthorGrozev, Grozdan
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpageS13
dc.source.endpageS19
dc.source.journalSolid State Technology
dc.source.issueMarch
dc.source.volume39
imec.availabilityPublished - imec


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