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Development, optimization and evaluation of a CF4 pre-treatment process to remove unwanted interfacial layers in stacks of CVD and PECVD polycrystalline silicon-germanium for MEMS applications
Publication:
Development, optimization and evaluation of a CF4 pre-treatment process to remove unwanted interfacial layers in stacks of CVD and PECVD polycrystalline silicon-germanium for MEMS applications
Date
2010
Meeting abstract
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21913.pdf
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Bryce, George
;
Severi, Simone
;
Van Hoof, Rita
;
Guo, Bin
;
Kunnen, Eddy
;
Witvrouw, Ann
;
Decoutere, Stefaan
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1876
since deposited on 2021-10-18
Acq. date: 2025-10-23
Citations
Metrics
Views
1876
since deposited on 2021-10-18
Acq. date: 2025-10-23
Citations