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LENS (Lithography Enhancement towards Nano Scale) a european project to support double exposure and double patterning technology development

dc.contributor.authorCantu, Pietro
dc.contributor.authorBaldi, Livio
dc.contributor.authorPiacentini, Paolo
dc.contributor.authorSytsma, Joost
dc.contributor.authorLe Gratiet, Bernard
dc.contributor.authorGaugiran, Stephanie
dc.contributor.authorWong, Patrick
dc.contributor.authorMiyashita, Hiroyuki
dc.contributor.authorAtzei, Luisa Rita
dc.contributor.authorBuch, Xavier
dc.contributor.authorVerkleij, Dick
dc.contributor.authorToublan, Olivier
dc.contributor.authorPerez-Murano, Francesco
dc.contributor.authorMecerreyes, David
dc.date.accessioned2021-10-18T15:29:06Z
dc.date.available2021-10-18T15:29:06Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16822
dc.sourceIIOimport
dc.titleLENS (Lithography Enhancement towards Nano Scale) a european project to support double exposure and double patterning technology development
dc.typeProceedings paper
dc.contributor.imecauthorWong, Patrick
dc.contributor.orcidimecWong, Patrick::0000-0003-3605-9680
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage764022
dc.source.conferenceOptical Microlithography XXIII
dc.source.conferencedate21/02/2010
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings SPIE; Vol.7640


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