Focus and dose de-convolution technique for improved CD-control of immersion clusters

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Authors
Charley, Anne-Laure; D'have, Koen; Leray, Philippe; Laidler, David; Cheng, Shaunee; Dusa, Mircea; Hinnen, Paul; Vanoppen, Peter
Conference
Metrology, Inspection and Process Control for Microlithography XXIV
Title
Focus and dose de-convolution technique for improved CD-control of immersion clusters
Publication type
Proceedings paper
Embargo date
9999-12-31
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