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Interface/bulk trap recovery after submeltl aser anneal and the impact to NBTI reliability

dc.contributor.authorCho, Moon Ju
dc.contributor.authorAoulaiche, Marc
dc.contributor.authorDegraeve, Robin
dc.contributor.authorOrtolland, Claude
dc.contributor.authorKauerauf, Thomas
dc.contributor.authorKaczer, Ben
dc.contributor.authorRoussel, Philippe
dc.contributor.authorHoffmann, Thomas Y.
dc.contributor.authorGroeseneken, Guido
dc.date.accessioned2021-10-18T15:35:14Z
dc.date.available2021-10-18T15:35:14Z
dc.date.issued2010
dc.identifier.issn0741-3106
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16866
dc.sourceIIOimport
dc.titleInterface/bulk trap recovery after submeltl aser anneal and the impact to NBTI reliability
dc.typeJournal article
dc.contributor.imecauthorDegraeve, Robin
dc.contributor.imecauthorKaczer, Ben
dc.contributor.imecauthorRoussel, Philippe
dc.contributor.imecauthorGroeseneken, Guido
dc.contributor.orcidimecKaczer, Ben::0000-0002-1484-4007
dc.contributor.orcidimecRoussel, Philippe::0000-0002-0402-8225
dc.source.peerreviewyes
dc.source.beginpage606
dc.source.endpage608
dc.source.journalIEEE Electron Device Letters
dc.source.issue6
dc.source.volume31
imec.availabilityPublished - imec


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