Authors

De Roest, David; Travaly, Youssef; Beynet, J.; Sprey, Hessel; Labat, J.; Huffman, Craig; Verdonck, Patrick; Kaneko, S; Matsushita, K; Kobayashi, N; Beyer, Gerald

DOI

10.1016/j.mee.2009.06.036

Issue

3

Journal

Microelectronic Engineering

Volume

87

Title

Variation in process conditions of porogen-based low-k films: A method to improve performance without changing existing process steps in a sub-100 nm Cu damascene integration route

Publication type

Journal article