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Influence op O2/H2 plasma substrate pre-treatment on the charge carrier parameters of (100) homepitaxial CVD diamond films

dc.contributor.authorDeferme, W.
dc.contributor.authorMalinauskas, T.
dc.contributor.authorJarasiunas, K,
dc.contributor.authorNesladek, Milos
dc.contributor.authorHaenen, Ken
dc.date.accessioned2021-10-18T15:57:07Z
dc.date.available2021-10-18T15:57:07Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16995
dc.sourceIIOimport
dc.titleInfluence op O2/H2 plasma substrate pre-treatment on the charge carrier parameters of (100) homepitaxial CVD diamond films
dc.typeMeeting abstract
dc.contributor.imecauthorNesladek, Milos
dc.contributor.imecauthorHaenen, Ken
dc.contributor.orcidimecHaenen, Ken::0000-0001-6711-7367
dc.source.peerreviewno
dc.source.conference21st European Conference on Diamond, Diamond-like Materials, Carbon Nanotubes, and Nitrides
dc.source.conferencedate5/09/2010
dc.source.conferencelocationBudapest Hungary
imec.availabilityPublished - imec


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