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Challenges for Atomic Layer Deposition for CMOS devices with high mobility channel materials

dc.contributor.authorDelabie, Annelies
dc.date.accessioned2021-10-18T15:58:06Z
dc.date.available2021-10-18T15:58:06Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17000
dc.sourceIIOimport
dc.titleChallenges for Atomic Layer Deposition for CMOS devices with high mobility channel materials
dc.typeOral presentation
dc.contributor.imecauthorDelabie, Annelies
dc.source.peerreviewno
dc.source.conferenceOxford Instruments Workshop
dc.source.conferencedate30/06/2010
dc.source.conferencelocationGlasgow UK
imec.availabilityPublished - imec


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