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Development of a dielectric CMP process for replacement gate applications

dc.contributor.authorDevriendt, Katia
dc.contributor.authorOng, Patrick
dc.contributor.authorKellens, Kristof
dc.contributor.authorVeloso, Anabela
dc.contributor.authorCrabbe, Yvo
dc.contributor.authorBrus, Stephan
dc.contributor.authorClaes, Martine
dc.contributor.authorLeunissen, Peter
dc.date.accessioned2021-10-18T16:02:29Z
dc.date.available2021-10-18T16:02:29Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17020
dc.sourceIIOimport
dc.titleDevelopment of a dielectric CMP process for replacement gate applications
dc.typeProceedings paper
dc.contributor.imecauthorDevriendt, Katia
dc.contributor.imecauthorOng, Patrick
dc.contributor.imecauthorKellens, Kristof
dc.contributor.imecauthorVeloso, Anabela
dc.contributor.imecauthorBrus, Stephan
dc.contributor.imecauthorClaes, Martine
dc.contributor.orcidimecDevriendt, Katia::0000-0002-0662-7926
dc.contributor.orcidimecOng, Patrick::0000-0002-2072-292X
dc.source.peerreviewno
dc.source.conferenceInternational Conference on Planarization Technology - ICPT
dc.source.conferencedate14/11/2010
dc.source.conferencelocationPhoenix, AZ USA
imec.availabilityPublished - imec


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