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A high performance of 0.18μm CMOS technology designed for manufacturability

dc.contributor.authorBadenes, Gonçal
dc.contributor.authorHendriks, Marton
dc.contributor.authorPerello, Carles
dc.contributor.authorDeferm, Ludo
dc.date.accessioned2021-09-30T07:55:02Z
dc.date.available2021-09-30T07:55:02Z
dc.date.issued1997
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/1705
dc.sourceIIOimport
dc.titleA high performance of 0.18μm CMOS technology designed for manufacturability
dc.typeProceedings paper
dc.contributor.imecauthorDeferm, Ludo
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage404
dc.source.endpage407
dc.source.conferenceESSDERC '97: Proceedings of the 27th European Solid-State Device Research Conference
dc.source.conferencedate22/09/1997
dc.source.conferencelocationStuttgart Germany
imec.availabilityPublished - imec


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