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Analysis and modeling of the high vacuum scanning spreading resistance microscopy nanocontact on silicon

dc.contributor.authorEyben, Pierre
dc.contributor.authorClemente, Francesca
dc.contributor.authorVanstreels, Kris
dc.contributor.authorPourtois, Geoffrey
dc.contributor.authorSankaran, Kiroubanand
dc.contributor.authorClarysse, Trudo
dc.contributor.authorMody, Jay
dc.contributor.authorDuriau, Edouard
dc.contributor.authorHantschel, Thomas
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorMylvaganam, Kausala
dc.contributor.authorZhang, Liangchi
dc.date.accessioned2021-10-18T16:18:25Z
dc.date.available2021-10-18T16:18:25Z
dc.date.issued2010
dc.identifier.issn1071-1023
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17091
dc.sourceIIOimport
dc.titleAnalysis and modeling of the high vacuum scanning spreading resistance microscopy nanocontact on silicon
dc.typeJournal article
dc.contributor.imecauthorEyben, Pierre
dc.contributor.imecauthorVanstreels, Kris
dc.contributor.imecauthorPourtois, Geoffrey
dc.contributor.imecauthorSankaran, Kiroubanand
dc.contributor.imecauthorHantschel, Thomas
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.orcidimecVanstreels, Kris::0000-0002-4420-0966
dc.contributor.orcidimecPourtois, Geoffrey::0000-0003-2597-8534
dc.contributor.orcidimecSankaran, Kiroubanand::0000-0001-6988-7269
dc.contributor.orcidimecHantschel, Thomas::0000-0001-9476-4084
dc.source.peerreviewyes
dc.source.beginpage401
dc.source.endpage406
dc.source.journalJournal of Vacuum Science and Technology B
dc.source.issue2
dc.source.volume28
imec.availabilityPublished - imec


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