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Development and optimization of scanning spreading resistance microscopy for measuring the two-dimensional carrier profile in solar cell structures

dc.contributor.authorEyben, Pierre
dc.contributor.authorSeidel, Felix
dc.contributor.authorHantschel, Thomas
dc.contributor.authorSchulze, Andreas
dc.contributor.authorLorenz, Anne
dc.contributor.authorUruena De Castro, Angel
dc.contributor.authorVan Gestel, Dries
dc.contributor.authorJohn, Joachim
dc.contributor.authorHorzel, Joerg
dc.contributor.authorVandervorst, Wilfried
dc.date.accessioned2021-10-18T16:18:54Z
dc.date.available2021-10-18T16:18:54Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17093
dc.sourceIIOimport
dc.titleDevelopment and optimization of scanning spreading resistance microscopy for measuring the two-dimensional carrier profile in solar cell structures
dc.typeMeeting abstract
dc.contributor.imecauthorEyben, Pierre
dc.contributor.imecauthorSeidel, Felix
dc.contributor.imecauthorHantschel, Thomas
dc.contributor.imecauthorJohn, Joachim
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.orcidimecHantschel, Thomas::0000-0001-9476-4084
dc.source.peerreviewno
dc.source.conferenceE-MRS Spring Meeting Symposium I: Advanced Silicon Materials Research for Electronic and Photovoltaic Applications
dc.source.conferencedate6/06/2010
dc.source.conferencelocationStrasbourg France
imec.availabilityPublished - imec


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