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Understanding RLS limitations for EUV pre-production stages ; impact of resist dissolution

dc.contributor.authorFonseca, Carlos
dc.contributor.authorShite, Hideo
dc.contributor.authorHead, Brian
dc.contributor.authorNafus, Kathleen
dc.contributor.authorGronheid, Roel
dc.contributor.authorWinroth, Gustaf
dc.date.accessioned2021-10-18T16:22:53Z
dc.date.available2021-10-18T16:22:53Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17109
dc.sourceIIOimport
dc.titleUnderstanding RLS limitations for EUV pre-production stages ; impact of resist dissolution
dc.typeProceedings paper
dc.contributor.imecauthorNafus, Kathleen
dc.contributor.imecauthorGronheid, Roel
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conferenceInternational Symposium on Extreme Ultraviolet Lithography
dc.source.conferencedate18/10/2010
dc.source.conferencelocationKobe Japan
imec.availabilityPublished - open access
imec.internalnotese-proceedings Sematech website


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