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Advances in dual-tone development for pitch frequency doubling

dc.contributor.authorFonseca, Carlos
dc.contributor.authorSomervell, Mark
dc.contributor.authorScheer, Steven
dc.contributor.authorKuwahara, Yuhei
dc.contributor.authorNafus, Kathleen
dc.contributor.authorGronheid, Roel
dc.contributor.authorTarutani, Shinji
dc.contributor.authorEnomoto, Yuuchiro
dc.date.accessioned2021-10-18T16:23:08Z
dc.date.available2021-10-18T16:23:08Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17110
dc.sourceIIOimport
dc.titleAdvances in dual-tone development for pitch frequency doubling
dc.typeProceedings paper
dc.contributor.imecauthorScheer, Steven
dc.contributor.imecauthorNafus, Kathleen
dc.contributor.imecauthorGronheid, Roel
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage76400E
dc.source.conferenceOptical Microlithography XXIII
dc.source.conferencedate21/02/2010
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings SPIE; Vol.7640


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