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ToF-SIMS and XPS study of ion implanted 248nm deep ultraviolet (DUV) photoresist

dc.contributor.authorFranquet, Alexis
dc.contributor.authorTsvetanova, Diana
dc.contributor.authorConard, Thierry
dc.contributor.authorVos, Rita
dc.contributor.authorVereecke, Guy
dc.contributor.authorMertens, Paul
dc.contributor.authorHeyns, Marc
dc.contributor.authorVandervorst, Wilfried
dc.date.accessioned2021-10-18T16:24:59Z
dc.date.available2021-10-18T16:24:59Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17117
dc.sourceIIOimport
dc.titleToF-SIMS and XPS study of ion implanted 248nm deep ultraviolet (DUV) photoresist
dc.typeOral presentation
dc.contributor.imecauthorFranquet, Alexis
dc.contributor.imecauthorTsvetanova, Diana
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorVereecke, Guy
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorHeyns, Marc
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.orcidimecFranquet, Alexis::0000-0002-7371-8852
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.source.peerreviewno
dc.source.conferenceMaterials for Advanced Metallization Conference - MAM
dc.source.conferencedate7/03/2010
dc.source.conferencelocationMechelen Belgium
imec.availabilityPublished - imec


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