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Evaluation of post ion-implantation resist strip with the background signal of a light scattering tool

dc.contributor.authorHalder, Sandip
dc.contributor.authorVos, Rita
dc.contributor.authorWada, Masayuki
dc.contributor.authorTsvetanova, Diana
dc.contributor.authorClaes, Martine
dc.contributor.authorMertens, Paul
dc.contributor.authorRadovanovic, Sanda
dc.contributor.authorDighe, Prasanna
dc.contributor.authorAmann, Christophe
dc.contributor.authorSimpson, Gavin
dc.contributor.authorPolli, Marco
dc.date.accessioned2021-10-18T16:49:15Z
dc.date.available2021-10-18T16:49:15Z
dc.date.issued2010
dc.identifier.issn0021-4922
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17208
dc.sourceIIOimport
dc.titleEvaluation of post ion-implantation resist strip with the background signal of a light scattering tool
dc.typeJournal article
dc.contributor.imecauthorHalder, Sandip
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorTsvetanova, Diana
dc.contributor.imecauthorClaes, Martine
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorSimpson, Gavin
dc.contributor.orcidimecHalder, Sandip::0000-0002-6314-2685
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage56504
dc.source.journalJapanese Journal of Applied Physics
dc.source.issue5
dc.source.volume49
imec.availabilityPublished - open access


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