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Performance of the ASML EUV Alpha demo tool

dc.contributor.authorHermans, Jan
dc.contributor.authorHendrickx, Eric
dc.contributor.authorLaidler, David
dc.contributor.authorJehoul, Christiane
dc.contributor.authorVan Den Heuvel, Dieter
dc.contributor.authorGoethals, Mieke
dc.date.accessioned2021-10-18T17:01:56Z
dc.date.available2021-10-18T17:01:56Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17253
dc.sourceIIOimport
dc.titlePerformance of the ASML EUV Alpha demo tool
dc.typeProceedings paper
dc.contributor.imecauthorHermans, Jan
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorLaidler, David
dc.contributor.imecauthorJehoul, Christiane
dc.contributor.imecauthorVan Den Heuvel, Dieter
dc.contributor.orcidimecHermans, Jan::0000-0003-1249-8902
dc.contributor.orcidimecLaidler, David::0000-0003-4055-3366
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage76361L
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography
dc.source.conferencedate21/02/2010
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings SPIE, Vol.7636


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