Study on practical application of pattern top resist loss measurement by CD-SEM for high NA immersion lithography
dc.contributor.author | Ishimoto, Toru | |
dc.contributor.author | Yasui, Naoki | |
dc.contributor.author | Hasegawa, Norio | |
dc.contributor.author | Tanaka, Maki | |
dc.contributor.author | Cheng, Shaunee | |
dc.date.accessioned | 2021-10-18T17:19:19Z | |
dc.date.available | 2021-10-18T17:19:19Z | |
dc.date.issued | 2010 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/17308 | |
dc.source | IIOimport | |
dc.title | Study on practical application of pattern top resist loss measurement by CD-SEM for high NA immersion lithography | |
dc.type | Proceedings paper | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.beginpage | 76382P | |
dc.source.conference | Metrology, Inspection and Process Control for Microlithography XXIV | |
dc.source.conferencedate | 21/02/2010 | |
dc.source.conferencelocation | San Jose, CA USA | |
imec.availability | Published - open access | |
imec.internalnotes | Proceedings SPIE; Vol.7638 |