Authors

Kesters, Els; Le, Quoc Toan; Lux, Marcel; Prager, Lutz; Vereecke, Guy

ISSN

0167-9317

Issue

9

Journal

Microelectronic Engineering

Volume

87

Title

Removal of post-etch 193-nm photoresist in porous low-k dielectric patterning using UV irradiation and ozonated water

Publication type

Journal article

Embargo date

9999-12-31