Proximity effects in dry developed lithography for sub-0.35 µm application

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Authors
Goethals, Mieke; Baik, Ki-Ho; Ronse, Kurt; Vertommen, Johan; Van den hove, Luc
Conference
Advances in Resist Technology and Processing XI
Title
Proximity effects in dry developed lithography for sub-0.35 µm application
Publication type
Proceedings paper
Embargo date
9999-12-31
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