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Conference contributions
Proximity effects in dry developed lithography for sub-0.35 µm application
Publication:
Proximity effects in dry developed lithography for sub-0.35 µm application
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Date
1994
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Goethals, Mieke
;
Baik, Ki-Ho
;
Ronse, Kurt
;
Vertommen, Johan
;
Van den hove, Luc
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2020
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Acq. date: 2025-12-12
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Views
2020
since deposited on 2021-09-29
1
last month
1
last week
Acq. date: 2025-12-12
Citations