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Effect of energetic ions on plasma damage of SiCOH low-k material

dc.contributor.authorKunnen, Eddy
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorFranquet, Alexis
dc.contributor.authorShamiryan, Denis
dc.contributor.authorRakhimova, Tatyana
dc.contributor.authorUrbanowicz, Adam
dc.contributor.authorStruyf, Herbert
dc.contributor.authorBoullart, Werner
dc.date.accessioned2021-10-18T17:50:19Z
dc.date.available2021-10-18T17:50:19Z
dc.date.issued2010
dc.identifier.issn1071-1023
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17407
dc.sourceIIOimport
dc.titleEffect of energetic ions on plasma damage of SiCOH low-k material
dc.typeJournal article
dc.contributor.imecauthorFranquet, Alexis
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.imecauthorBoullart, Werner
dc.contributor.orcidimecFranquet, Alexis::0000-0002-7371-8852
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage450
dc.source.endpage459
dc.source.journalJournal of Vacuum Science and Technology B
dc.source.issue3
dc.source.volume28
imec.availabilityPublished - open access


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