Effect of top power on a low-k film during oxygen strip in a TCP chamber
dc.contributor.author | Kunnen, Eddy | |
dc.contributor.author | Rakhimova, Tatyana | |
dc.contributor.author | Shamiryan, Denis | |
dc.contributor.author | Struyf, Herbert | |
dc.contributor.author | Boullart, Werner | |
dc.contributor.author | Baklanov, Mikhaïl | |
dc.date.accessioned | 2021-10-18T17:50:59Z | |
dc.date.available | 2021-10-18T17:50:59Z | |
dc.date.issued | 2010 | |
dc.identifier.issn | 0167-9317 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/17409 | |
dc.source | IIOimport | |
dc.title | Effect of top power on a low-k film during oxygen strip in a TCP chamber | |
dc.type | Journal article | |
dc.contributor.imecauthor | Struyf, Herbert | |
dc.contributor.imecauthor | Boullart, Werner | |
dc.contributor.orcidimec | Boullart, Werner::0000-0001-7614-2097 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 462 | |
dc.source.endpage | 465 | |
dc.source.journal | Microelectronic Engineering | |
dc.source.issue | 3 | |
dc.source.volume | 87 | |
imec.availability | Published - imec |
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