Show simple item record

Measuring resist-induced contrast loss using EUV interference lithography

dc.contributor.authorLangner, Andreas
dc.contributor.authorSolak, Harun H.
dc.contributor.authorGronheid, Roel
dc.contributor.authorvan Setten, Eelco
dc.contributor.authorAuzelyte, Vaida
dc.contributor.authorEkinci, Yasin
dc.contributor.authorvan Ingen Schenau, Koen
dc.contributor.authorFeenstra, Kees
dc.date.accessioned2021-10-18T17:57:41Z
dc.date.available2021-10-18T17:57:41Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17429
dc.sourceIIOimport
dc.titleMeasuring resist-induced contrast loss using EUV interference lithography
dc.typeProceedings paper
dc.contributor.imecauthorGronheid, Roel
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage76362X
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography
dc.source.conferencedate21/02/2010
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol.7636


Files in this item

Thumbnail
Name:
20385.pdf
Size:
1.885Mb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record