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Poly(olefin sulfone)s - A materials platform for studying resist derived contamination

dc.contributor.authorLawrie, Kirsten
dc.contributor.authorBlakey, Idriss
dc.contributor.authorBlinco, James
dc.contributor.authorGronheid, Roel
dc.contributor.authorJack, Kevin
dc.contributor.authorPollentier, Ivan
dc.contributor.authorLeeson, Michael
dc.contributor.authorYounkin, Todd
dc.contributor.authorWhittaker, Andrew
dc.date.accessioned2021-10-18T18:04:21Z
dc.date.available2021-10-18T18:04:21Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17452
dc.sourceIIOimport
dc.titlePoly(olefin sulfone)s - A materials platform for studying resist derived contamination
dc.typeProceedings paper
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conferenceInternational Symposium on Extreme Ultraviolet Lithography
dc.source.conferencedate18/10/2010
dc.source.conferencelocationKobe Japan
imec.availabilityPublished - open access
imec.internalnotese-proceedings Sematech website


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