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Protein patterning on polycrystalline silicon–germanium via standard UV lithography for bioMEMS applications

dc.contributor.authorLenci, Silvia
dc.contributor.authorTedeschi, Lorena
dc.contributor.authorDomenici, Claudio
dc.contributor.authorLande, Caterina
dc.contributor.authorNannini, Andrea
dc.contributor.authorPennelli, Giovanni
dc.contributor.authorPieri, Francesco
dc.contributor.authorSeveri, Simone
dc.date.accessioned2021-10-18T18:08:53Z
dc.date.available2021-10-18T18:08:53Z
dc.date.issued2010
dc.identifier.issn0928-4931
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17466
dc.sourceIIOimport
dc.titleProtein patterning on polycrystalline silicon–germanium via standard UV lithography for bioMEMS applications
dc.typeJournal article
dc.contributor.imecauthorLenci, Silvia
dc.contributor.imecauthorSeveri, Simone
dc.source.peerreviewyes
dc.source.beginpage1221
dc.source.endpage1226
dc.source.journalMaterials Science and Engineering C
dc.source.issue8
dc.source.volume30
imec.availabilityPublished - imec


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