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Scatterometry metrology validation with respect to process control

dc.contributor.authorLeray, Philippe
dc.contributor.authorCheng, Shaunee
dc.contributor.authorLaidler, David
dc.contributor.authorD'have, Koen
dc.contributor.authorCharley, Anne-Laure
dc.date.accessioned2021-10-18T18:13:05Z
dc.date.available2021-10-18T18:13:05Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17479
dc.sourceIIOimport
dc.titleScatterometry metrology validation with respect to process control
dc.typeProceedings paper
dc.contributor.imecauthorLeray, Philippe
dc.contributor.imecauthorLaidler, David
dc.contributor.imecauthorD'have, Koen
dc.contributor.imecauthorCharley, Anne-Laure
dc.contributor.orcidimecLaidler, David::0000-0003-4055-3366
dc.contributor.orcidimecD'have, Koen::0000-0002-5195-9241
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage76380X
dc.source.conferenceMetrology, Inspection and Process Control for Microlithography XXIV
dc.source.conferencedate21/02/2010
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol.7638


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