dc.contributor.author | Leray, Philippe | |
dc.contributor.author | Cheng, Shaunee | |
dc.contributor.author | Laidler, David | |
dc.contributor.author | D'have, Koen | |
dc.contributor.author | Charley, Anne-Laure | |
dc.date.accessioned | 2021-10-18T18:13:05Z | |
dc.date.available | 2021-10-18T18:13:05Z | |
dc.date.issued | 2010 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/17479 | |
dc.source | IIOimport | |
dc.title | Scatterometry metrology validation with respect to process control | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Leray, Philippe | |
dc.contributor.imecauthor | Laidler, David | |
dc.contributor.imecauthor | D'have, Koen | |
dc.contributor.imecauthor | Charley, Anne-Laure | |
dc.contributor.orcidimec | Laidler, David::0000-0003-4055-3366 | |
dc.contributor.orcidimec | D'have, Koen::0000-0002-5195-9241 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.beginpage | 76380X | |
dc.source.conference | Metrology, Inspection and Process Control for Microlithography XXIV | |
dc.source.conferencedate | 21/02/2010 | |
dc.source.conferencelocation | San Jose, CA USA | |
imec.availability | Published - open access | |
imec.internalnotes | Proceedings of SPIE; Vol.7638 | |