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Achieving optimum diffraction based overlay performance

dc.contributor.authorLeray, Philippe
dc.contributor.authorLaidler, David
dc.contributor.authorCheng, Shaunee
dc.contributor.authorCoogans, Martyn
dc.contributor.authorFuchs, Andreas
dc.contributor.authorPonomarenko, Mariya
dc.contributor.authorvan der Schaar, Maurits
dc.contributor.authorVanoppen, Peter
dc.date.accessioned2021-10-18T18:13:26Z
dc.date.available2021-10-18T18:13:26Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17480
dc.sourceIIOimport
dc.titleAchieving optimum diffraction based overlay performance
dc.typeProceedings paper
dc.contributor.imecauthorLeray, Philippe
dc.contributor.imecauthorLaidler, David
dc.contributor.orcidimecLaidler, David::0000-0003-4055-3366
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage76382B
dc.source.conferenceMetrology, Inspection and Process Control for Microlithography XXIV
dc.source.conferencedate21/02/2010
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol.7638


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