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Electrochemical, physical, and electrical characterization of two clean solutions for Cu PCMP clean

dc.contributor.authorLi, Yunlong
dc.contributor.authorHeylen, Nancy
dc.contributor.authorDaviot, Jerome
dc.contributor.authorReid, Chris
dc.contributor.authorLeunissen, Peter
dc.date.accessioned2021-10-18T18:16:28Z
dc.date.available2021-10-18T18:16:28Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17489
dc.sourceIIOimport
dc.titleElectrochemical, physical, and electrical characterization of two clean solutions for Cu PCMP clean
dc.typeMeeting abstract
dc.contributor.imecauthorLi, Yunlong
dc.contributor.imecauthorHeylen, Nancy
dc.contributor.orcidimecLi, Yunlong::0000-0003-4791-4013
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage64
dc.source.endpage65
dc.source.conference10th International Symposium on Ultra-Clean Processing of Semiconductor Devices - UCPSS
dc.source.conferencedate19/09/2010
dc.source.conferencelocationOostende Belgium
imec.availabilityPublished - open access


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