Show simple item record

Easy, inexpensive, solution-processed high-k gate dielectric materials for large area circuit applications

dc.contributor.authorLin, Wan-Yu
dc.contributor.authorMuller, Robert
dc.contributor.authorMyny, Kris
dc.contributor.authorSteudel, Soeren
dc.contributor.authorGenoe, Jan
dc.contributor.authorHeremans, Paul
dc.date.accessioned2021-10-18T18:20:22Z
dc.date.available2021-10-18T18:20:22Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17500
dc.sourceIIOimport
dc.titleEasy, inexpensive, solution-processed high-k gate dielectric materials for large area circuit applications
dc.typeOral presentation
dc.contributor.imecauthorMyny, Kris
dc.contributor.imecauthorGenoe, Jan
dc.contributor.imecauthorHeremans, Paul
dc.contributor.orcidimecMyny, Kris::0000-0002-5230-495X
dc.contributor.orcidimecGenoe, Jan::0000-0002-4019-5979
dc.contributor.orcidimecHeremans, Paul::0000-0003-2151-1718
dc.source.peerreviewno
dc.source.conference4th Solvay COPE Symposium on Organic Electronics
dc.source.conferencedate6/05/2010
dc.source.conferencelocationLeuven Belgium
imec.availabilityPublished - imec


Files in this item

FilesSizeFormatView

There are no files associated with this item.

This item appears in the following collection(s)

Show simple item record