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Low cost solution-processed high-k gate dielectric materials for large area circuit applications

dc.contributor.authorLin, Wan-Yu
dc.contributor.authorMuller, Robert
dc.contributor.authorSteudel, Soeren
dc.contributor.authorGenoe, Jan
dc.contributor.authorHeremans, Paul
dc.date.accessioned2021-10-18T18:21:02Z
dc.date.available2021-10-18T18:21:02Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17502
dc.sourceIIOimport
dc.titleLow cost solution-processed high-k gate dielectric materials for large area circuit applications
dc.typeOral presentation
dc.contributor.imecauthorGenoe, Jan
dc.contributor.imecauthorHeremans, Paul
dc.contributor.orcidimecGenoe, Jan::0000-0002-4019-5979
dc.contributor.orcidimecHeremans, Paul::0000-0003-2151-1718
dc.source.peerreviewno
dc.source.conference3rd International Symposium on Flexible Organic Electronics - IS-FOE10
dc.source.conferencedate6/07/2010
dc.source.conferencelocationHalkidiki Greece
imec.availabilityPublished - imec


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