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Epitaxial Si, SiGe and Ge for high-performance devices

dc.contributor.authorLoo, Roger
dc.contributor.authorHikavyy, Andriy
dc.contributor.authorVincent, Benjamin
dc.contributor.authorWang, Gang
dc.contributor.authorVanherle, Wendy
dc.contributor.authorGencarelli, Federica
dc.contributor.authorNguyen, Duy
dc.contributor.authorRosseel, Erik
dc.contributor.authorSouriau, Laurent
dc.contributor.authorRondas, Dirk
dc.contributor.authorDekoster, Johan
dc.contributor.authorCaymax, Matty
dc.date.accessioned2021-10-18T18:29:33Z
dc.date.available2021-10-18T18:29:33Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17526
dc.sourceIIOimport
dc.titleEpitaxial Si, SiGe and Ge for high-performance devices
dc.typeOral presentation
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorHikavyy, Andriy
dc.contributor.imecauthorVincent, Benjamin
dc.contributor.imecauthorVanherle, Wendy
dc.contributor.imecauthorRosseel, Erik
dc.contributor.imecauthorSouriau, Laurent
dc.contributor.imecauthorRondas, Dirk
dc.contributor.imecauthorDekoster, Johan
dc.contributor.imecauthorCaymax, Matty
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.contributor.orcidimecHikavyy, Andriy::0000-0002-8201-075X
dc.contributor.orcidimecSouriau, Laurent::0000-0002-5138-5938
dc.source.peerreviewno
dc.source.conferenceASM User Meeting
dc.source.conferencedate23/09/2010
dc.source.conferencelocationMünchen Germany
imec.availabilityPublished - imec


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