dc.contributor.author | Loo, Roger | |
dc.contributor.author | Wang, Gang | |
dc.contributor.author | Souriau, Laurent | |
dc.contributor.author | Lin, Vic | |
dc.contributor.author | Takeuchi, Shotaro | |
dc.contributor.author | Brammertz, Guy | |
dc.contributor.author | Caymax, Matty | |
dc.date.accessioned | 2021-10-18T18:30:41Z | |
dc.date.available | 2021-10-18T18:30:41Z | |
dc.date.issued | 2010 | |
dc.identifier.issn | 0013-4651 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/17529 | |
dc.source | IIOimport | |
dc.title | High quality Ge virtual substrates on Si wafers with standard STI patterning | |
dc.type | Journal article | |
dc.contributor.imecauthor | Loo, Roger | |
dc.contributor.imecauthor | Souriau, Laurent | |
dc.contributor.imecauthor | Brammertz, Guy | |
dc.contributor.imecauthor | Caymax, Matty | |
dc.contributor.orcidimec | Loo, Roger::0000-0003-3513-6058 | |
dc.contributor.orcidimec | Souriau, Laurent::0000-0002-5138-5938 | |
dc.contributor.orcidimec | Brammertz, Guy::0000-0003-1404-7339 | |
dc.source.peerreview | yes | |
dc.source.beginpage | H13 | |
dc.source.endpage | H21 | |
dc.source.journal | Journal of the Electrochemical Society | |
dc.source.issue | 1 | |
dc.source.volume | 157 | |
imec.availability | Published - imec | |