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Full chip correction of EUV design

dc.contributor.authorLorusso, Gian
dc.contributor.authorHendrickx, Eric
dc.contributor.authorFenger, Germain
dc.contributor.authorNiroomand, Ardavan
dc.date.accessioned2021-10-18T18:32:05Z
dc.date.available2021-10-18T18:32:05Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17533
dc.sourceIIOimport
dc.titleFull chip correction of EUV design
dc.typeProceedings paper
dc.contributor.imecauthorLorusso, Gian
dc.contributor.imecauthorHendrickx, Eric
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage763615
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography
dc.source.conferencedate21/02/2010
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol.7636


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