Show simple item record

EUV mask defectivity study by existing DUV tools and new EBEAM technology

dc.contributor.authorMangan, Shmoolik
dc.contributor.authorJonckheere, Rik
dc.contributor.authorVan Den Heuvel, Dieter
dc.contributor.authorRozentsvige, Moshe
dc.contributor.authorKudriashov, Vladislav
dc.contributor.authorShoval, Lior
dc.contributor.authorSantoro, Gaetano
dc.contributor.authorEnglard, Ilan
dc.date.accessioned2021-10-18T18:44:19Z
dc.date.available2021-10-18T18:44:19Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17567
dc.sourceIIOimport
dc.titleEUV mask defectivity study by existing DUV tools and new EBEAM technology
dc.typeOral presentation
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorVan Den Heuvel, Dieter
dc.contributor.imecauthorSantoro, Gaetano
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.source.peerreviewno
dc.source.conferenceSPIE Photomask Technology
dc.source.conferencedate13/09/2010
dc.source.conferencelocationMonterey, CA USA
imec.availabilityPublished - imec
imec.internalnotesPaper 7823-63; not in proceedings


Files in this item

FilesSizeFormatView

There are no files associated with this item.

This item appears in the following collection(s)

Show simple item record