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0.25 µm optical lithography based on surface imaging and dry development

dc.contributor.authorGoethals, Mieke
dc.contributor.authorVan den hove, Luc
dc.date.accessioned2021-09-29T12:41:40Z
dc.date.available2021-09-29T12:41:40Z
dc.date.issued1994
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/175
dc.sourceIIOimport
dc.title0.25 µm optical lithography based on surface imaging and dry development
dc.typeProceedings paper
dc.contributor.imecauthorVan den hove, Luc
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage109
dc.source.endpage116
dc.source.conferenceInternational Conference on Advanced Microelectronic Devices and Processing - AMDP
dc.source.conferencedate03/03/1994
dc.source.conferencelocationSendai Japan
imec.availabilityPublished - open access


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