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MOCVD of NiO thin films using Ni(dmamb)2

dc.contributor.authorMeersschaut, Johan
dc.contributor.authorToeller, M.
dc.contributor.authorSchaekers, Marc
dc.contributor.authorWang, Xin Peng
dc.contributor.authorGoux, Ludovic
dc.contributor.authorGovoreanu, Bogdan
dc.contributor.authorWouters, Dirk
dc.contributor.authorJurczak, Gosia
dc.contributor.authorAltimime, Laith
dc.contributor.authorBender, Hugo
dc.contributor.authorConard, Thierry
dc.contributor.authorFranquet, Alexis
dc.contributor.authorBrijs, Bert
dc.contributor.authorVan Elshocht, Sven
dc.date.accessioned2021-10-18T19:00:58Z
dc.date.available2021-10-18T19:00:58Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17612
dc.sourceIIOimport
dc.titleMOCVD of NiO thin films using Ni(dmamb)2
dc.typeMeeting abstract
dc.contributor.imecauthorMeersschaut, Johan
dc.contributor.imecauthorSchaekers, Marc
dc.contributor.imecauthorGoux, Ludovic
dc.contributor.imecauthorGovoreanu, Bogdan
dc.contributor.imecauthorJurczak, Gosia
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorFranquet, Alexis
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.orcidimecMeersschaut, Johan::0000-0003-2467-1784
dc.contributor.orcidimecSchaekers, Marc::0000-0002-1496-7816
dc.contributor.orcidimecGoux, Ludovic::0000-0002-1276-2278
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecFranquet, Alexis::0000-0002-7371-8852
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage1515
dc.source.conference218th ECS Meeting
dc.source.conferencedate10/10/2010
dc.source.conferencelocationLas Vegas, NV USA
imec.availabilityPublished - open access
imec.internalnotesMeeting Abstracts; Vol. MA 2010-02


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