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Impact of thinning and through silicon via proximity on high-k / metal gate first CMOS performance

dc.contributor.authorMercha, Abdelkarim
dc.contributor.authorRedolfi, Augusto
dc.contributor.authorStucchi, Michele
dc.contributor.authorMinas, Nikolaos
dc.contributor.authorVan Olmen, Jan
dc.contributor.authorThangaraju, Sarasvathi
dc.contributor.authorVelenis, Dimitrios
dc.contributor.authorDomae, Shinichi
dc.contributor.authorYang, Yu
dc.contributor.authorKatti, Guruprasad
dc.contributor.authorLabie, Riet
dc.contributor.authorOkoro, Chukwudi
dc.contributor.authorZhao, Ming
dc.contributor.authorAsimakopoulos, Panagiotis
dc.contributor.authorDe Wolf, Ingrid
dc.contributor.authorChiarella, Thomas
dc.contributor.authorSchram, Tom
dc.contributor.authorRohr, Erika
dc.contributor.authorVan Ammel, Annemie
dc.contributor.authorJourdain, Anne
dc.contributor.authorRuythooren, Wouter
dc.contributor.authorArmini, Silvia
dc.contributor.authorRadisic, Alex
dc.contributor.authorPhilipsen, Harold
dc.contributor.authorHeylen, Nancy
dc.contributor.authorKostermans, Maarten
dc.contributor.authorJaenen, Patrick
dc.contributor.authorSleeckx, Erik
dc.contributor.authorSabuncuoglu Tezcan, Deniz
dc.contributor.authorDebusschere, Ingrid
dc.contributor.authorSoussan, Philippe
dc.contributor.authorPerry, Dan
dc.contributor.authorVan der Plas, Geert
dc.contributor.authorCho, Jong Hoon
dc.contributor.authorMarchal, Pol
dc.contributor.authorTravaly, Youssef
dc.contributor.authorBeyne, Eric
dc.contributor.authorBiesemans, Serge
dc.contributor.authorSwinnen, Bart
dc.date.accessioned2021-10-18T19:04:18Z
dc.date.available2021-10-18T19:04:18Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17620
dc.sourceIIOimport
dc.titleImpact of thinning and through silicon via proximity on high-k / metal gate first CMOS performance
dc.typeProceedings paper
dc.contributor.imecauthorMercha, Abdelkarim
dc.contributor.imecauthorRedolfi, Augusto
dc.contributor.imecauthorStucchi, Michele
dc.contributor.imecauthorVan Olmen, Jan
dc.contributor.imecauthorVelenis, Dimitrios
dc.contributor.imecauthorLabie, Riet
dc.contributor.imecauthorZhao, Ming
dc.contributor.imecauthorDe Wolf, Ingrid
dc.contributor.imecauthorChiarella, Thomas
dc.contributor.imecauthorSchram, Tom
dc.contributor.imecauthorVan Ammel, Annemie
dc.contributor.imecauthorJourdain, Anne
dc.contributor.imecauthorRuythooren, Wouter
dc.contributor.imecauthorArmini, Silvia
dc.contributor.imecauthorRadisic, Alex
dc.contributor.imecauthorPhilipsen, Harold
dc.contributor.imecauthorHeylen, Nancy
dc.contributor.imecauthorJaenen, Patrick
dc.contributor.imecauthorSleeckx, Erik
dc.contributor.imecauthorSabuncuoglu Tezcan, Deniz
dc.contributor.imecauthorDebusschere, Ingrid
dc.contributor.imecauthorSoussan, Philippe
dc.contributor.imecauthorVan der Plas, Geert
dc.contributor.imecauthorBeyne, Eric
dc.contributor.imecauthorBiesemans, Serge
dc.contributor.imecauthorSwinnen, Bart
dc.contributor.orcidimecMercha, Abdelkarim::0000-0002-2174-6958
dc.contributor.orcidimecLabie, Riet::0000-0002-1401-1291
dc.contributor.orcidimecZhao, Ming::0000-0002-0856-851X
dc.contributor.orcidimecDe Wolf, Ingrid::0000-0003-3822-5953
dc.contributor.orcidimecChiarella, Thomas::0000-0002-6155-9030
dc.contributor.orcidimecArmini, Silvia::0000-0003-0578-3422
dc.contributor.orcidimecPhilipsen, Harold::0000-0002-5029-1104
dc.contributor.orcidimecSleeckx, Erik::0000-0003-2560-6132
dc.contributor.orcidimecSabuncuoglu Tezcan, Deniz::0000-0002-9237-7862
dc.contributor.orcidimecSoussan, Philippe::0000-0002-1347-6978
dc.contributor.orcidimecVan der Plas, Geert::0000-0002-4975-6672
dc.contributor.orcidimecBeyne, Eric::0000-0002-3096-050X
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage109
dc.source.endpage110
dc.source.conferenceIEEE Symposium on VLSI Technology
dc.source.conferencedate15/06/2010
dc.source.conferencelocationHonolulu, HI US
imec.availabilityPublished - open access


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