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Study on metrology of ERU tuning in TCP reactor using PVx2 sensor wafer

dc.contributor.authorMilenin, Alexey
dc.contributor.authorde Marneffe, Jean-Francois
dc.contributor.authorStruyf, Herbert
dc.contributor.authorBoullart, Werner
dc.contributor.authorArleo, Paul
dc.date.accessioned2021-10-18T19:08:11Z
dc.date.available2021-10-18T19:08:11Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17630
dc.sourceIIOimport
dc.titleStudy on metrology of ERU tuning in TCP reactor using PVx2 sensor wafer
dc.typeProceedings paper
dc.contributor.imecauthorMilenin, Alexey
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.imecauthorBoullart, Werner
dc.contributor.orcidimecMilenin, Alexey::0000-0003-0747-0462
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage34
dc.source.endpage38
dc.source.conferenceIEEE/SEMI Advanced Semiconductor Manufacturing Conference - ASMC
dc.source.conferencedate11/07/2010
dc.source.conferencelocationSan Francisco, CA USA
dc.identifier.urlhttp://semi.omnibooksonline.com/asmc/data/papers/1_7.pdf
imec.availabilityPublished - open access


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