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Performance of FlexRay, a fully programmable illumination system for generation of freeform sources on high NA immersion systems

dc.contributor.authorMulder, Melchior
dc.contributor.authorEngelen, Andre
dc.contributor.authorNoordman, Oscar
dc.contributor.authorStreutker, Gert
dc.contributor.authorvan Drieenhuizen, Bert
dc.contributor.authorvan Nuenen, Cas
dc.contributor.authorEndendijk, Wilfred
dc.contributor.authorVerbeeck, Jef
dc.contributor.authorBouman, Wim
dc.contributor.authorBouma, Anita
dc.contributor.authorKazinczi, Robert
dc.contributor.authorSocha, Robert
dc.contributor.authorJuergens, Dirk
dc.contributor.authorZimmermann, Joerg
dc.contributor.authorTrauter, Bastian
dc.contributor.authorBekaert, Joost
dc.contributor.authorLaenens, Bart
dc.contributor.authorCorliss, Daniel
dc.contributor.authorMcIntyre, Greg
dc.date.accessioned2021-10-18T19:20:40Z
dc.date.available2021-10-18T19:20:40Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17660
dc.sourceIIOimport
dc.titlePerformance of FlexRay, a fully programmable illumination system for generation of freeform sources on high NA immersion systems
dc.typeProceedings paper
dc.contributor.imecauthorBekaert, Joost
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage76401P
dc.source.conferenceOptical Microlithography XXIII
dc.source.conferencedate21/02/2010
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings SPIE, vol. 7640


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