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Texture of atomic layer deposited ruthenium

dc.contributor.authorMusschoot, J.
dc.contributor.authorXie, Q.
dc.contributor.authorDeduytsche, D.
dc.contributor.authorDe Keyser, K.
dc.contributor.authorLongrie, D.
dc.contributor.authorHaemers, J.
dc.contributor.authorVan den Berghe, S.
dc.contributor.authorVan Meirhaeghe, R.L.
dc.contributor.authorD'Haen, Jan
dc.contributor.authorDetavernier, C.
dc.date.accessioned2021-10-18T19:22:50Z
dc.date.available2021-10-18T19:22:50Z
dc.date.issued2010
dc.identifier.issn0167-9317
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17666
dc.sourceIIOimport
dc.titleTexture of atomic layer deposited ruthenium
dc.typeJournal article
dc.contributor.imecauthorD'Haen, Jan
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage1879
dc.source.endpage1883
dc.source.journalMicroelectronic Engineering
dc.source.issue10
dc.source.volume87
imec.availabilityPublished - open access


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