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Direct copper plating on a RuTa substrate

dc.contributor.authorNagar, Magi
dc.contributor.authorRadisic, Alex
dc.contributor.authorStrubbe, Katrien
dc.contributor.authorVereecken, Philippe
dc.date.accessioned2021-10-18T19:27:18Z
dc.date.available2021-10-18T19:27:18Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17677
dc.sourceIIOimport
dc.titleDirect copper plating on a RuTa substrate
dc.typeMeeting abstract
dc.contributor.imecauthorRadisic, Alex
dc.contributor.imecauthorVereecken, Philippe
dc.contributor.orcidimecVereecken, Philippe::0000-0003-4115-0075
dc.source.peerreviewno
dc.source.beginpage1259
dc.source.conference217th ECS Meeting Symposium "Electrochemical Engineering for the 21st Century"
dc.source.conferencedate24/04/2010
dc.source.conferencelocationVancouver Canada
imec.availabilityPublished - imec
imec.internalnotesMeeting Abstracts; Vol. 2010-01


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