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Use of p- and n-type vapor phase doping and sub-melt laser anneal for extension junctions in sub-32 nm CMOS technology
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Authors
Nguyen, Duy
;
Rosseel, Erik
;
Takeuchi, Shotaro
;
Everaert, Jean-Luc
;
Yang, Lijun
;
Goossens, Jozefien
;
Moussa, Alain
;
Clarysse, Trudo
;
Richard, Olivier
;
Bender, Hugo
;
Zaima, S.
;
Sakai, A.
;
Loo, Roger
;
Lin, J.C.
;
Vandervorst, Wilfried
;
Caymax, Matty
ISSN
0040-6090
Issue
6, Suppl. 1
Journal
Thin Solid Films
Volume
518
Title
Use of p- and n-type vapor phase doping and sub-melt laser anneal for extension junctions in sub-32 nm CMOS technology
Publication type
Journal article
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