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Characterization of epitaxial Pb(Zr,Ti)O3 thin films deposited by pulsed laser deposition on silicon cantilevers

dc.contributor.authorNguyen, M.D.
dc.contributor.authorNazeer, H.
dc.contributor.authorKarakaya, Koray
dc.contributor.authorPham, S.V.
dc.contributor.authorSteenwelle, R.
dc.contributor.authorDekkers, M.
dc.contributor.authorAbelmann, L.
dc.contributor.authorBlank, M.
dc.contributor.authorRijnders, G.
dc.date.accessioned2021-10-18T19:33:30Z
dc.date.available2021-10-18T19:33:30Z
dc.date.issued2010
dc.identifier.issn0960-1317
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17692
dc.sourceIIOimport
dc.titleCharacterization of epitaxial Pb(Zr,Ti)O3 thin films deposited by pulsed laser deposition on silicon cantilevers
dc.typeJournal article
dc.source.peerreviewyes
dc.source.beginpage85022
dc.source.journalJournal of Micromechanics and Microengineering
dc.source.issue8
dc.source.volume20
imec.availabilityPublished - imec


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