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Lithographic evaluation of a new wet silylation process using safe solvents and the commercial photoresist AZ 5214E

dc.contributor.authorGogolides, E.
dc.contributor.authorBaik, Ki-Ho
dc.contributor.authorYannakopolou, K.
dc.contributor.authorVan den hove, Luc
dc.date.accessioned2021-09-29T12:41:42Z
dc.date.available2021-09-29T12:41:42Z
dc.date.issued1994
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/176
dc.sourceIIOimport
dc.titleLithographic evaluation of a new wet silylation process using safe solvents and the commercial photoresist AZ 5214E
dc.typeJournal article
dc.contributor.imecauthorVan den hove, Luc
dc.source.peerreviewno
dc.source.beginpage267
dc.source.endpage270
dc.source.journalMicroelectron. Eng.
dc.source.volume23
imec.availabilityPublished - imec
imec.internalnotesPaper from the Microelectronic Engineering Conference; Sept. 1993; Maastricht, The Netherlands


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