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Lithographic evaluation of a new wet silylation process using safe solvents and the commercial photoresist AZ 5214E
Publication:
Lithographic evaluation of a new wet silylation process using safe solvents and the commercial photoresist AZ 5214E
Date
1994
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Gogolides, E.
;
Baik, Ki-Ho
;
Yannakopolou, K.
;
Van den hove, Luc
Journal
Microelectron. Eng.
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2024
since deposited on 2021-09-29
Acq. date: 2025-10-23
Citations
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Views
2024
since deposited on 2021-09-29
Acq. date: 2025-10-23
Citations