Publication:
Lithographic evaluation of a new wet silylation process using safe solvents and the commercial photoresist AZ 5214E
Date
| dc.contributor.author | Gogolides, E. | |
| dc.contributor.author | Baik, Ki-Ho | |
| dc.contributor.author | Yannakopolou, K. | |
| dc.contributor.author | Van den hove, Luc | |
| dc.contributor.imecauthor | Van den hove, Luc | |
| dc.date.accessioned | 2021-09-29T12:41:42Z | |
| dc.date.available | 2021-09-29T12:41:42Z | |
| dc.date.issued | 1994 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/176 | |
| dc.source.beginpage | 267 | |
| dc.source.endpage | 270 | |
| dc.source.journal | Microelectron. Eng. | |
| dc.source.volume | 23 | |
| dc.title | Lithographic evaluation of a new wet silylation process using safe solvents and the commercial photoresist AZ 5214E | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | ||
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