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Laser annealed junctions: pocket profile analysis using an atomistic kinetic Monte Carlo approach

dc.contributor.authorNoda, Taiji
dc.contributor.authorOrtolland, Claude
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorVrancken, Christa
dc.contributor.authorRosseel, Erik
dc.contributor.authorClarysse, Trudo
dc.contributor.authorAbsil, Philippe
dc.contributor.authorBiesemans, Serge
dc.contributor.authorHoffmann, Thomas Y.
dc.date.accessioned2021-10-18T19:38:28Z
dc.date.available2021-10-18T19:38:28Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17704
dc.sourceIIOimport
dc.titleLaser annealed junctions: pocket profile analysis using an atomistic kinetic Monte Carlo approach
dc.typeProceedings paper
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorVrancken, Christa
dc.contributor.imecauthorRosseel, Erik
dc.contributor.imecauthorAbsil, Philippe
dc.contributor.imecauthorBiesemans, Serge
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage73
dc.source.endpage74
dc.source.conferenceIEEE Symposium on VLSI Technology
dc.source.conferencedate15/06/2010
dc.source.conferencelocationHonolulu, HI USA
imec.availabilityPublished - open access


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