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CMP of Ge for high mobility channels

dc.contributor.authorOng, Patrick
dc.contributor.authorWitters, Liesbeth
dc.contributor.authorLeunissen, Peter
dc.date.accessioned2021-10-18T19:49:32Z
dc.date.available2021-10-18T19:49:32Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17732
dc.sourceIIOimport
dc.titleCMP of Ge for high mobility channels
dc.typeProceedings paper
dc.contributor.imecauthorOng, Patrick
dc.contributor.imecauthorWitters, Liesbeth
dc.contributor.orcidimecOng, Patrick::0000-0002-2072-292X
dc.source.peerreviewyes
dc.source.conferenceInternational Conference on Planarization/CMP Technology - ICPT
dc.source.conferencedate14/11/2010
dc.source.conferencelocationPhoenix, AZ USA
imec.availabilityPublished - imec


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