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Ion-implantation-based low-cost Hk/MG process for CMOS low-power application

dc.contributor.authorOrtolland, Claude
dc.contributor.authorSahhaf, Sahar
dc.contributor.authorSrividya, Vidya
dc.contributor.authorDegraeve, Robin
dc.contributor.authorSaino, Kanta
dc.contributor.authorKim, Chul-Sung
dc.contributor.authorGilbert, Matthieu
dc.contributor.authorKauerauf, Thomas
dc.contributor.authorCho, Moon Ju
dc.contributor.authorDehan, Morin
dc.contributor.authorSchram, Tom
dc.contributor.authorTogo, Mitsuhiro
dc.contributor.authorHoriguchi, Naoto
dc.contributor.authorGroeseneken, Guido
dc.contributor.authorBiesemans, Serge
dc.contributor.authorAbsil, Philippe
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorGealy, Dan
dc.contributor.authorHoffmann, Thomas Y.
dc.date.accessioned2021-10-18T19:55:29Z
dc.date.available2021-10-18T19:55:29Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17747
dc.sourceIIOimport
dc.titleIon-implantation-based low-cost Hk/MG process for CMOS low-power application
dc.typeProceedings paper
dc.contributor.imecauthorSahhaf, Sahar
dc.contributor.imecauthorDegraeve, Robin
dc.contributor.imecauthorSchram, Tom
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.imecauthorGroeseneken, Guido
dc.contributor.imecauthorBiesemans, Serge
dc.contributor.imecauthorAbsil, Philippe
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.orcidimecSchram, Tom::0000-0003-1533-7055
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage185
dc.source.endpage186
dc.source.conferenceIEEE Symposium on VLSI Technology
dc.source.conferencedate15/06/2010
dc.source.conferencelocationHonolulu, HI US
imec.availabilityPublished - open access


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